Atomic layer deposition apparatus

• Main Authors: CHEN QINGYAO, PAN LIJUN, BAI HAIJIAN, ZHANG ENCI
• Format: Patent
• Language: Chinese; English
• Published: 19.01.2024
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The utility model relates to the technical field of semiconductor production equipment, in particular to atomic layer deposition equipment which comprises a bottom cover and a vacuum ring, and the bottom cover is provided with an annular groove which is concentrically distributed with the bottom cov...