Bubble removal type high-quality dispensing structure

• Main Authors: LI HAIQIANG, CHEN RONGKAI
• Format: Patent
• Language: Chinese; English
• Published: 02.01.2024
• Subjects: APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; PERFORMING OPERATIONS; SPRAYING OR ATOMISING IN GENERAL; TRANSPORTING

The bubble removing type high-quality dispensing structure comprises a colloid accommodating bin, a colloid outlet channel is arranged at the bottom of the colloid accommodating bin, a colloid extrusion plate is arranged corresponding to the colloid outlet channel, colloid extrusion holes are unifor...