Gas suspension device for vapor deposition furnace

• Main Authors: OU ZHIQIANG, YUAN YONGHONG, LIN HAO
• Format: Patent
• Language: Chinese; English
• Published: 29.12.2023
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The utility model relates to the technical field of semiconductors, in particular to a gas suspension device for a vapor deposition furnace. In order to solve the problem of device failure caused by abnormal suspension and rotation of a graphite plate in the prior art, the adopted scheme is as follows: the device comprises a graphite substrate and a base, the base is positioned below the graphite substrate; an air uniformizing chamber and a main air inlet channel are arranged in the base; the main gas inlet channel is used for conveying gas for pushing the graphite substrate to rotate; the main air inlet channel is communicated with the air uniformizing chamber and the side surface of the base; multiple groups of air outlet channels are formed in the upper surface of the base; all the gas outlet channels are circumferentially distributed around the center of the gas uniformizing chamber and also circumferentially distributed around the center of the graphite substrate; the air outlet channel is communicated w