Semiconductor marking dust removal mechanism

The utility model aims to provide the semiconductor marking dust removal mechanism which is simple in structure and is not easy to accumulate dust through convection type dust removal and regular reverse blowing. The device comprises a laser marking machine, a positioning seat, an air suction assemb...

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Bibliographic Details
Main Authors ZHENG MINGRUI, PAN HUICHAO, CHEN YUEMING, CHEN QUANSHUAI, LI QUNLIN, WANG PENGBO
Format Patent
LanguageChinese
English
Published 15.12.2023
Subjects
CLEANING
CLEANING IN GENERAL
PERFORMING OPERATIONS
PREVENTION OF FOULING IN GENERAL
TRANSPORTING
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Summary:The utility model aims to provide the semiconductor marking dust removal mechanism which is simple in structure and is not easy to accumulate dust through convection type dust removal and regular reverse blowing. The device comprises a laser marking machine, a positioning seat, an air suction assembly, a dust removal assembly and a negative pressure positioning assembly, the laser marking machine is arranged above the positioning seat, the positioning seat is connected with an external fixing mechanism and drives a product to rotate, the fixed end of the air suction assembly is connected with the external fixing mechanism, and the dust removal assembly is connected with the negative pressure positioning assembly. The movable end of the dust removal assembly is in blowing fit with the laser marking position of the positioning seat, the dust removal assembly is fixed to one side of the positioning seat and matched with the air suction assembly, the negative pressure positioning assembly is in sliding fit with t
Bibliography:Application Number: CN202321381717U