Substrate table fine adjustment device

• Main Authors: NIU WENHAO, YANG YEYU, GU ZHENG
• Format: Patent
• Language: Chinese; English
• Published: 20.10.2023
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The utility model provides a fine adjustment device for a substrate table, and belongs to the technical field of microwave plasma chemical vapor deposition. The lifting device comprises a connecting seat used for being connected with a substrate table, a lifting seat is arranged below the connecting seat, a lifting driving assembly for driving the lifting seat to ascend and descend is arranged on one side of the lifting seat, the lifting driving assembly comprises a shell connected with the bottom face of the connecting seat, a first wedge-shaped block is arranged in the shell in an up-down moving mode, and the first wedge-shaped block is connected with the lifting seat. A first wedge-shaped block is arranged on one side of the shell, a second wedge-shaped block which is matched with the first wedge-shaped block and freely and horizontally moves is arranged on one side of the shell, and a motor which drives the second wedge-shaped block to freely and horizontally move is arranged on one side of the shell. The