Shockproof bearing table and glue uniformizing and liquid supplying device

• Main Authors: CHEN SHENGHUA, JIANG YANSONG, GENG KETAO
• Format: Patent
• Language: Chinese; English
• Published: 21.07.2023
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BLASTING; CINEMATOGRAPHY; ELECTROGRAPHY; ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS; HEATING; HOLOGRAPHY; LIGHTING; MATERIALS THEREFOR; MEANS FOR DAMPING VIBRATION; MECHANICAL ENGINEERING; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL; PHYSICS; SEPARATION; SHOCK-ABSORBERS; SPRINGS; THERMAL INSULATION IN GENERAL; TRANSPORTING; WEAPONS

The utility model provides a shockproof bearing table and a glue uniformizing and liquid supplying device. The shockproof bearing table comprises a buffering assembly and a glue uniformizing and liquid supplying assembly, a defoaming piece; a bracket; a base; wherein the support is arranged on one side of the defoaming piece, the defoaming piece is fixed by the support, the buffer assembly is arranged at the bottom of the support, and the end, away from the support, of the buffer assembly is connected with the base. According to the utility model, the problems that the bubble removal effect in the photoresist is reduced due to the fact that the photoresist has certain viscosity when the working environment vibrates, and new bubbles are possibly introduced to further influence the bubble removal effect are solved. 本实用新型提供了一种防震承载台及匀胶供液装置，防震承载台包括：缓冲组件；去泡件；支架；底座；其中，支架设于去泡件的一侧，去泡件由支架固定，支架底部设有缓冲组件，缓冲组件远离支架的一端连接底座。本实用新型解决了当工作环境出现震动时，由于光刻胶本身存在一定粘度，光刻胶中的气泡去除效果会有所下降，同时可能引入新的气泡进一步影响去除气泡效果的问题。