Cavity ceramic ring and processing equipment of semiconductor device

• Main Authors: QIU DAYI, XU FUNAN, YANG GUOJUN
• Format: Patent
• Language: Chinese; English
• Published: 30.06.2023
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

The utility model provides a cavity ceramic ring and processing equipment of a semiconductor device. The cavity ceramic ring comprises a ceramic ring body which is used for being matched with the spraying plate and the wafer tray to form a reaction cavity for processing wafers; and the position adjusting mechanism is connected with the ceramic ring body and is used for driving the ceramic ring body to perform transverse and/or longitudinal displacement. By arranging the position adjusting mechanism, the cavity ceramic ring can have left-right and up-down adjusting functions, so that the heating disc and the ceramic ring are concentric, and the uniformity of the periphery of the film is controlled. 本实用新型提供了一种腔体陶瓷环以及一种半导体器件的加工设备。上述腔体陶瓷环包括陶瓷环本体，用于配合喷淋板及晶圆托盘构成加工晶圆的反应腔；以及位置调节机构，连接陶瓷环本体，用于驱动陶瓷环本体进行横向和/或纵向的位移。通过配置该位置调节机构，该腔体陶瓷环能够使得腔体陶瓷环具备左右与上下的调整功能，以使得加热盘与陶瓷环同心，从而控制薄膜外围的均匀性。