Photoresist supply temporary storage device

• Main Author: HUANG ZONGYOU
• Format: Patent
• Language: Chinese; English
• Published: 16.12.2022
• Subjects: APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; PERFORMING OPERATIONS; SPRAYING OR ATOMISING IN GENERAL; TRANSPORTING

The utility model provides a photoresist supply temporary storage device, and relates to the field of photoetching manufacturing processes. The photoresist supply temporary storage device comprises a temporary storage tank which comprises a photoresist inlet, a photoresist outlet and an exhaust port; the vacuumizing assembly is communicated with the exhaust port; one end of the supply channel is communicated with the photoresist inlet, and the other end of the supply channel is communicated with a photoresist container and is immersed in the photoresist liquid in the photoresist container. According to the invention, automatic supply of the high-viscosity photoresist can be realized. 本申请提供一种光刻胶补给暂存装置，该装置涉及光刻制造工艺领域。该光刻胶补给暂存装置包括：暂存罐，包括光刻胶入口、光刻胶出口和排气口；抽真空组件，与所述排气口连通；补给通道，其一端与所述光刻胶入口连通，所述补给通道的另一端与光刻胶容器连通并没入所述光刻胶容器中的光刻胶液体中。本申请可实现高粘度的光刻胶自动补给。