Photoresist coating production device suitable for 365-nanometer ultraviolet curing

• Main Authors: WANG JUN, JI CHENGGANG, JIANG JIANGUO, FENG XUPING
• Format: Patent
• Language: Chinese; English
• Published: 13.12.2022
• Subjects: APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; MIXING, e.g. DISSOLVING, EMULSIFYING, DISPERSING; PERFORMING OPERATIONS; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL; SPRAYING OR ATOMISING IN GENERAL; TRANSPORTING

The utility model discloses a photoresist coating production device suitable for 365 nanometer ultraviolet curing, which comprises a working frame, the top end of the working frame is fixedly connected with a stirring barrel, one side of the stirring barrel is fixedly connected with a stirring motor, and the output end of the stirring motor penetrates through the stirring barrel and extends into the stirring barrel. And the output end of the stirring motor is fixedly connected with a material mixing rod, the tail end of the material mixing rod is rotationally connected with the inner side wall of the stirring barrel, and the top end of the stirring barrel is fixedly connected with a feeding hopper. According to the coating device, the support can be rotated through the arranged pushing spring, so that the coating wheel can conveniently conduct coating, meanwhile, coating stirred by the stirring barrel can directly enter the surface of the coating wheel through the discharging pipe, and in-time coating can be