Mask plate for manufacturing patterned sapphire substrate

• Main Authors: WANG GANG, DING JIANFENG, ZHANG YANGYANG, YAO ZHIYAN, PAN XIAOZHONG
• Format: Patent
• Language: Chinese; English
• Published: 22.11.2022
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

The utility model relates to the field of photoetching, in particular to a mask plate for manufacturing a graphical sapphire substrate, which comprises a base, a placing rod, a mounting block, an equipment body and a fixing device, the placing rod is fixedly connected with the surface of the base, the mounting block is fixedly connected with the surface of the base, and the equipment body is placed on the surface of the placing rod. The fixing devices are arranged on the surfaces of the mounting blocks, stabilizing blocks are fixedly connected to the surface of the equipment body, extension springs are arranged on the inner walls of the mounting blocks, connecting rods are fixedly connected to the two ends of the extension springs, and the connecting rods are slidably connected with the inner walls of the mounting blocks. According to the utility model, the fixing device is arranged, so that the equipment body can be conveniently placed, the equipment body is ensured to be more stable when being placed, and t