Supporting device applied to array exposure vacuum drying for improving Mura

• Main Authors: XU SHUNLONG, LU JINZHENG
• Format: Patent
• Language: Chinese; English
• Published: 05.04.2022
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; ELECTROGRAPHY; FREQUENCY-CHANGING; HOLOGRAPHY; MATERIALS THEREFOR; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL LOGIC ELEMENTS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF

The utility model discloses a supporting device applied to array exposure vacuum drying for improving Mura, which belongs to the technical field of LCD (liquid crystal display) panels and comprises an operating table, a magnetic bearing plate, a supporting pile, a supporting mechanism and a cylinder. The upper surface of the magnetic bearing plate is provided with a plurality of scale marks in the X-axis direction and a plurality of scale marks in the Y-axis direction, so that the placement position of the supporting pile can be conveniently and accurately adjusted; according to the supporting pile, the magnetic base and the magnetic bearing plate are arranged to be mutually attracted through magnetic force, the supporting pile can be conveniently fixed to any position, the phenomenon that in the drying process, due to the supporting pile, light resistance curing on an LCD panel is not uniform, and consequently Mura is caused can be avoided, and the yield of LCD products is increased; by arranging the air cyl