Photoetching machine and mask structure thereof

The utility model relates to the technical field of photoetching machines, in particular to a photoetching machine and a mask structure thereof, and the mask structure comprises an upper template, a lower template, a mask mounting plate and a mask plate, the mask mounting plate is a floating plate a...

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Bibliographic Details
Main Author HUO JINCHONG
Format Patent
LanguageChinese
English
Published 07.12.2021
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:The utility model relates to the technical field of photoetching machines, in particular to a photoetching machine and a mask structure thereof, and the mask structure comprises an upper template, a lower template, a mask mounting plate and a mask plate, the mask mounting plate is a floating plate and is used for being mounted on an upper template; the mask plate is used for being mounted on the mask mounting plate so as to move along with the mask mounting plate; the lower template is used for bearing a wafer; the upper template can ascend and descend relative to the lower template so as to drive the mask plate to be relatively close to or away from the wafer, and the mask plate can abut against the wafer when being relatively close to the wafer. According to the scheme of the utility model, when the upper template drives the mask plate to approach the wafer until the mask plate abuts against the wafer, the mask plate can be pushed by the wafer in the process of pressing down the wafer, so that each corner o
Bibliography:Application Number: CN202121532930U