Two-section type adsorption photomask

• Main Authors: JIN HUAJUN, WU CONGYUAN
• Format: Patent
• Language: Chinese; English
• Published: 23.11.2021
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The utility model discloses a two-section type adsorption photomask which comprises a mask frame, a first mask plate, a second mask plate, a substrate and a magnetic plate, the magnetism of the first mask plate is larger than that of the second mask plate, and the second mask plate and the first mask plate are sequentially overlapped and fixed on one surface of the mask frame in a mutually clung manner. A substrate is arranged on one side, far away from the second mask plate, of the first mask plate, and a magnetic plate is arranged on one side, far away from the first mask plate, of the substrate. The panel areas on the first mask plate and the openings on the second mask plate have the same number and are overlapped in a one-to-one correspondence manner, and the panel areas can completely cover the corresponding openings and are only overlapped with one opening. The size of a formed film on the substrate is jointly determined by the first mask plate and the second mask plate, and the first mask plate and th