Wet etching device for silicon wafer

• Main Authors: MIAO XINHAI, QIAN SHAOBO, WANG YOUWEI
• Format: Patent
• Language: Chinese; English
• Published: 09.11.2021
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

The utility model provides a wet etching device for a silicon wafer, the silicon wafer is composed of a major arc section and a straight line section, the device comprises a support and a shell, etching liquid medicine is arranged in the shell, the shell is provided with an etching liquid medicine circulating assembly, the support is immersed in the etching liquid medicine, and the support is provided with a water inlet and a water outlet. A plurality of slots matched with the silicon wafers are formed in the support at intervals in the length direction, the silicon wafers are vertically arranged in the slots, a rotating shaft used for driving the silicon wafers to rotate in the limiting grooves is arranged below the support, the section of the rotating shaft is in a kidney round shape, grooves matched with corners on the silicon wafers are formed in the two arc surfaces of the rotating shaft, and the silicon wafers are arranged in the grooves. The grooves are formed in the junction of the upper cambered surf