Substrate table, lithographic apparatus and liquid confinement system

• Main Authors: WILHELMUS JACOBUS JOHANNES WELTERS, LAURA MARIA FERNANDEZ DIAZ, DIRK WILLEM HARBERTS, JOHANNES ADRIANUS CORNELIS MARIA PIJNENBURG, SOETHOUDT ABRAHAM ALEXANDER, POIESZ THOMAS, BERT DIRK SCHOLTEN, LUCAS HENRICUS JOHANNES STEVENS, VAN DE WINKEL JIMMY M W
• Format: Patent
• Language: Chinese; English
• Published: 04.05.2021
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

A substrate table, a lithographic apparatus and a liquid confinement system are disclosed. There is provided a substrate table for an immersion system, the immersion system comprising: a projection system arranged to project an image onto a substrate; and a liquid confinement system configured to confine immersion liquid in a space between the projection system and the substrate. The substrate table includes: a substrate holder configured to hold a substrate; and a current control device arranged to reduce a current flowing between the substrate and the substrate holder while the immersion liquid is confined in the space. 公开了一种衬底台、一种光刻设备和一种液体限制系统。提供了一种用于浸没系统的衬底台，所述浸没系统包括：投影系统，布置成将图像投影到衬底上；和液体限制系统，配置成将浸没液体限制在所述投影系统和所述衬底之间的空间中。所述衬底台包括：衬底保持器，配置成保持衬底；和电流控制装置，布置成在所述浸没液体被限制在所述空间中的同时减小在所述衬底和所述衬底保持器之间流动的电流。