Reaction feeding control device for ternary precursor production

• Main Authors: HUANG DIANKUN, WANG WEISHAN, CAI RIXIN
• Format: Patent
• Language: Chinese; English
• Published: 08.12.2020
• Subjects: CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY; CONTROLLING; PERFORMING OPERATIONS; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL; PHYSICS; REGULATING; SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES; THEIR RELEVANT APPARATUS; TRANSPORTING

The utility model discloses a ternary precursor production reaction feeding control device which mainly comprises a feeding buffer tank, a feeding pump, a reactor, a flow meter and an adjusting valve,the feeding buffer tank is connected with an inlet of the feeding pump, the feeding pump is connected with the reactor, and the adjusting valve is arranged on an outlet pipeline of the feeding buffertank and the feeding pump. Flow meter is arranged on an inlet pipeline of the reactor. By adopting the device, the production control precision can be improved, the control precision can be improvedto 0.2%-0.5%, the effect of obviously improving the product performance is achieved, meanwhile, the equipment investment and the occupied area are reduced, and obvious economic benefits are achieved. 本实用新型公开了一种三元前驱体生产反应进料控制装置，主要由进料缓冲罐、进料泵、反应器、流量计及调节阀组成，进料缓冲罐与进料泵进口连接，进料泵与反应器连接，在进料缓冲罐与进料泵出口管线设有调节阀，反应器进口管线设有流量计。采用本装置能提高生产控制精度，其控制精度能提高到0.2%~0.5%，对产品性能的提高有明显的效果，同时减少设备投资和占地，有明显的经济效益。