Multilayer substrate forming method and multilayer substrate forming apparatus

The utility model provides a multi-layer substrate forming method and a multi-layer substrate forming device for forming a multi-layer substrate by using one device. The multilayer substrate forming method includes: a fixing step of fixing a substrate on a table; a first layer forming step of formin...

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Bibliographic Details
Main Author OSHIMA EIJI
Format Patent
LanguageChinese
English
Published 01.12.2020
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Summary:The utility model provides a multi-layer substrate forming method and a multi-layer substrate forming device for forming a multi-layer substrate by using one device. The multilayer substrate forming method includes: a fixing step of fixing a substrate on a table; a first layer forming step of forming a mixed material layer in which a conductive material and a photocurable resin are mixed on the substrate fixed to the table; a first exposure step of exposing the mixed material layer to a laser scan corresponding to the first circuit pattern data; a first cleaning step of cleaning the mixed material on the exposed substrate; a second layer forming step of forming an insulating resin layer on the cleaned substrate; a second exposure step of exposing the insulating resin layer by laser scanning corresponding to the through-hole data; a second cleaning step of cleaning the insulating resin on the exposed substrate; a third layer forming step of forming a mixed material layer on the cleanedsubstrate; a third exposu
Bibliography:Application Number: CN201921827863U