Combined photomask

• Main Authors: TONG LIFENG, YANG YAOHUA
• Format: Patent
• Language: Chinese; English
• Published: 16.06.2020
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

The utility model provides a combined photomask. The combined photomask comprises at least two photomasks, each photomask is provided with a pattern; when the photomasks are overlapped, the photomasksare overlapped; the patterns on the photomasks are spaced from one another; sequential exposure of a plurality of photomasks is achieved under the condition that photoresist is spin-coated on the MCTlayer only once by utilizing the combined photomask exposure, ideal holes and lines can be obtained on the MCT layer, the accuracy of the feature sizes of the holes and the lines on the MCT layer isimproved, and meanwhile, the modeling difficulty of an OPC model is reduced. 本实用新型提供了一种组合光罩，所述组合光罩包括至少两个光罩，每个光罩上具有图形，各所述光罩重叠时，各所述光罩上的图形相互间隔，利用所述组合光罩曝光在MCT层上只旋涂一次光刻胶的情况下实现多个光罩的顺序曝光，可以在MCT层上得到理想的孔洞和线条，提高了MCT层上的孔洞和线条的特征尺寸的精度，同时降低了OPC模型建模的难度。