Plasma vapour deposition equipment

• Main Authors: YUAN YUAN, LIN ZONGXIAN
• Format: Patent
• Language: Chinese; English
• Published: 17.04.2018
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The utility model provides a plasma vapour deposition equipment, include: the shield cover, the material of shield cover is non metallic member, set up in the target backplate of shield cover top, with the shield cover forms "The reaction chamber", set up in the radio frequency electric field generating device in the shield cover outside, in form the radio frequency electric field among the "The reaction chamber", set up in the wafer supporting base of "The reaction chamber" bottom, and, set up in the magnet of target backplate top. The utility model discloses a plasma vapour deposition equipment with the coil setting on the lateral wall of shield cover to this consumption of saving the coil need not to change the coil, simultaneously, change the material of shield cover for the pottery, increased the cycle that the shield cover was changed under the condition that does not influence the radio frequency electric field action, greatly practice thrift the cost, be suitable for large -scale production to use. 本实