Two -sided etch apparatus of aluminium foil

• Main Authors: TAO HUARONG, JIA YONGDE, QI XILIN, WANG FUCHENG, GUO ZHONGLIANG
• Format: Patent
• Language: Chinese; English
• Published: 16.03.2018
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25; NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE

The utility model relates to a two -sided etch apparatus of aluminium foil, include double -deck frame and set up the liquid treatment trough in double -deck frame and lead the paper tinsel device, double -deck frame includes upper diaphragm and lower floor's diaphragm, it includes that the first paper tinsel frame of leading leads the paper tinsel frame and go out the paper tinsel machine and receive the paper tinsel quick -wittedly with the second to lead the paper tinsel device, the liquid treatment trough includes from the left extremely right first pure water sink on upper diaphragm thatsets gradually, the etching tank of layouting, positive degree of depth etching tank and set gradually the reverse side degree of depth etching tank on lower floor's diaphragm from the right side a toleft side, second pure water sink and third pure water sink, the aluminium foil is from going out the paper tinsel machine in proper order via the first paper tinsel frame of leading, first pure water sink, the etching tank o