Supplementary micrometer frame of levelling staff of adjustable observation bench mark position

• Main Authors: ZHANG YANFANG, HE XUAN, LIANG YANCHAO, LI HENG, LI XINGFEN, QIN YANBEI, DING SHAOWEI, ZHANG ZHICHAO, ZHANG ZHONGHUA, CUI DONGHAI, ZHANG YUNDUAN, GUAN PENGJU, YE JINGLEI, LIU JIA, DU WENSHAO, MA HAIXIA, CAO WEI, ZHANG HEKUN, GUO KELAO
• Format: Patent
• Language: Chinese; English
• Published: 23.11.2016
• Subjects: GYROSCOPIC INSTRUMENTS; MEASURING; MEASURING DISTANCES, LEVELS OR BEARINGS; NAVIGATION; PHOTOGRAMMETRY OR VIDEOGRAMMETRY; PHYSICS; SURVEYING; TESTING

The utility model belongs to the technical field of measure, concretely relates to supplementary micrometer frame of levelling staff of adjustable observation bench mark position, including benchmark connecting plate and strutting arrangement, the benchmark connecting plate is the panel of a rectangular shape, and strutting arrangement sets up the free end at the benchmark connecting plate, and the stiff end lower surface of benchmark connecting plate is provided with the lantern ring, and the free end lower surface of benchmark connecting plate is provided with the card frame, installs two level pipes on the face of benchmark connecting plate, and benchmark connecting plate fixed mounting on being close to the face of free end has the spherical observation station of extending. The step of supplementary micrometer frame observation procedure does: one, the supplementary micrometer frame of installation, two, the supplementary micrometer frame of adjustment, three, the supplementary micrometer frame constant