Mask cavity device

• Main Authors: Shinichi KURITA, Makoto INAGAWA, Suhas BHOSKI
• Format: Patent
• Language: Chinese; English
• Published: 24.08.2016
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

This paper the embodiment relate to the mask cavity device of the processing that is used for display substrates. The mask cavity configures the part that is used for making the great processing system of OLED device into. The mask cavity can configure the mask heating and cooling to utilizing into during the all deposit technology in processing system. The mask cavity can be including the cavity body, the volume is injectd to the cavity body, the one or more box that holds a plurality of masks is received for being suitable for to the design of volume size. The heater that is coupled to the cavity body in the volume can configure into: when utilize the mask in the deposition process cavity before, heat the mask controllablely, and after using in the deposition process cavity, the cooling the mask. 本文所述的实施例涉及用于显示基板的处理的掩模腔室装置。所述掩模腔室可以是配置成用于制造OLED器件的较大的处理系统的部分。所述掩模腔室可配置成对在处理系统中的诸沉积工艺期间所利用的掩模加热和冷却。所述掩模腔室可以包括腔室体，所述腔室体限定容积，所述体积尺寸设计为适于接收容纳多个掩模的个或多个盒。在所述容积内耦接至腔室体的加热器可配置成：当在沉积处理腔室中利用掩模之前，可控地加热掩模；并且在沉积处理腔室中使用之后，冷却所述掩模