Gas distributor

• Main Authors: CRAIG BERCAW, LAN YUNFENG, ZHAO XINGMEI, SU YANBO
• Format: Patent
• Language: Chinese; English
• Published: 01.06.2016
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The utility model discloses a gas distributor, internally be equipped with radial gas distribution and be responsible for at this, be responsible for both sides dislocation set gas distribution branch pipe at gas distribution, and reduce gradually to gas distribution branch pipe direction tube way cross -sectional area along the gas distribution person in charge, form arborescent gas distribution network, reaction gas or steam that the intake pipe of messenger's follow gas distribution network center let in can be blown the silicon chip surface to covering by the outlet duct that numerous laws distribute perpendicularly uniformly, can realize the even reaction on the silicon chip, and the reaction efficiency is improved, practice thrift reaction gas consumption and reduce the equipment volume, still can make the sweeping gas easily with gas distribution network border position to remain gas purging clean, prevent effectively that the mistake takes place the CVD reaction in the ALD reaction, have the productiv