A interior extrinsic cycle nitration mixture washing tank for sapphire and cleaning equipment thereof

• Main Authors: WANG LEHAO, LYU CHENGPENG, YU YUZHAI, LYU KANGLI, WEI MINGDE, ZHANG LIMING
• Format: Patent
• Language: English
• Published: 30.12.2015
• Subjects: CLEANING; CLEANING IN GENERAL; PERFORMING OPERATIONS; PREVENTION OF FOULING IN GENERAL; TRANSPORTING

The utility model discloses an interior extrinsic cycle nitration mixture washing tank belongs to semiconductor device technical field for the sapphire including inside groove (2), connect dioxygen water pipe and sulphuric acid pipe in the inside groove, still include water jacket (1), open the water jacket bottom has a plurality of circulation holes, circulation hole external circulation pipeline (6), and last connect circulating pump (8) of circulation pipeline, another termination of circulating pump has the circulation to advance the acid tube, and the acid tube that circulates lets in to the inside groove in, be provided with temperature sensor and heater on the lateral wall of inside groove, concentrated sulfuric acid position sensor (5) and hydrogen peroxide solution position sensor (4) have been set gradually by low to the height on the lateral wall of water jacket, the utility model also provides a cleaning equipment including above -mentioned washing tank. Through setting up the water jacket, make and add acidizing fluid stream to the water jacket in the inside groove, in rethread water jacket circulating reflux to the inside groove, can increase the activity of mixing liquid with the concentrated sulfuric acid, the hydrogen peroxide solution intensive mixing of inslot, effective cleaning efficiency that improves the sapphire wafer.