Wet etching device

• Main Authors: ZOU SHUAI, WANG XUSHENG, XING GUOQIANG
• Format: Patent
• Language: English
• Published: 16.12.2015
• Subjects: BASIC ELECTRIC ELEMENTS; CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION ORPROCESSING OF GOODS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; SEMICONDUCTOR DEVICES; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS; TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINSTCLIMATE CHANGE

The utility model discloses a wet etching device, including interior sculpture groove and extrinsic cycle groove, the extrinsic cycle grooved ring is located the periphery wall in interior sculpture groove, it bears the box to have placed the silicon chip in the interior sculpture groove, the top in interior sculpture groove is less than the top in extrinsic cycle groove, the top in extrinsic cycle groove is equipped with sealed capping, wet etching device still includes ozone generator, the bottom entry linkage in interior sculpture groove ozone generator's solution export, the bottom exit linkage in extrinsic cycle groove ozone generator's solution entry, it matches with ozone technology well, avoids ozone to reveal and causes the injury to the human body.