A burnishing machine for ultra -thin flexible display substrate of chemically mechanical polishing

• Main Authors: MA LIJIE, CHENG HAIFENG, WANG ZHANKUI, YAO JIANGUO, PANG ZIRUI, FU SUFANG, SU JIANXIU, LI YONGFENG
• Format: Patent
• Language: English
• Published: 04.11.2015
• Subjects: DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS; GRINDING; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; PERFORMING OPERATIONS; POLISHING; TRANSPORTING

The utility model provides a burnishing machine for ultra -thin flexible display substrate of chemically mechanical polishing, the key point of the technical scheme of the utility model is, a burnishing machine for ultra -thin flexible display substrate of chemically mechanical polishing, be provided with horizontal roller at the rear that unreels the roller, the rear of horizontal roller is provided with back drive wheel device, back drive wheel device's rear is provided with burnishing roll mechanism, the below of burnishing roll mechanism is provided with washing liquid collection device, the burnishing roll is preceding, be equipped with polish spray set between the roller of burnishing roll mechanism and the roller, the rear of burnishing roll mechanism is equipped with preceding drive wheel device, preceding drive wheel device's rear is equipped with the guide pulley, the rear of guide pulley is equipped with the wiper mechanism, the rear of wiper mechanism is equipped with wind and drenches the device, the below that wind drenches the device is equipped with washing liquid collection device, the rear that wind drenches the device is equipped with the wind -up roll. The utility model has the advantages of simple structure, low cost.