Sequential deposition device for refractive index matching layer in shadow elimination glass

• Main Authors: XU GENBAO, JIN KEWU, YAO TINGTING, YANG YONG, JIANG JIWEN, WANG YUN, ZHANG KUANXIANG, CAO XIN
• Format: Patent
• Language: English
• Published: 22.04.2015
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The utility model provides a sequential deposition device for a refractive index matching layer in shadow elimination glass. The sequential deposition device comprises a first sputtering unit for sputtering a target by use of a first working gas so that the atoms of the material of the target can be deposited on a substrate, and a second sputtering unit for sputtering the target by use of a second working gas so that the atoms of the material of the target can be deposited on the substrate. By use of a magnetron sputtering method, the sequential deposition device is capable of realizing the preparation of the refractive index matching layer only by changing the introduced gases without changing the target; the sequential deposition device is simple in structure, convenient to prepare, low in cost, capable of effectively eliminate etch shadow and advantageous for large-scale production of an enterprise.