Hairbrush machine for cleaning semiconductor substrate

• Main Authors: CHEN JIANHUA, ZHAO LIANG, LIAO MINGJUN, JIANG QINSU
• Format: Patent
• Language: Chinese; English
• Published: 13.02.2013
• Subjects: CLEANING; CLEANING IN GENERAL; PERFORMING OPERATIONS; PREVENTION OF FOULING IN GENERAL; TRANSPORTING

The utility model provides a hairbrush machine for cleaning a semiconductor substrate. The hairbrush machine comprises a machine table, and two groups of brackets symmetrically arranged on the machine table; a cleaning mechanism is erected between the two groups of the brackets; the cleaning mechanism comprises a rotating shaft and a hairbrush; shaft holes with a quantity which is two times as much as the quantity of the cleaning mechanism are respectively arranged on the two groups of the brackets; the shaft holes of the two groups of the brackets correspond two by two; springs are mounted at the tops inside the shaft holes; the rotating shaft penetrates through the shaft holes which correspond two by two, so that the springs are correspondingly pressed to the shaft wall of the rotating shaft; and the hairbrush is located between the two groups of the brackets, so that a middle part of the rotating shaft can be covered. The springs can be used for adjusting the size of a stress of the hairbrush on the substr