Ultra-wide rolling machine with horizontally adjustable lower roller center distance
The utility model discloses a super-wide plate lapping machine with a horizontally adjustable lower roller center distance, which relates to the technical field of lapping machines. Two pedestals are arranged above a machine stand; the bottom of each pedestal is respectively provided with a sliding...
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Main Authors | , , , , , , |
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Format | Patent |
Language | Chinese English |
Published |
24.12.2008
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Subjects | |
Online Access | Get full text |
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Summary: | The utility model discloses a super-wide plate lapping machine with a horizontally adjustable lower roller center distance, which relates to the technical field of lapping machines. Two pedestals are arranged above a machine stand; the bottom of each pedestal is respectively provided with a sliding plate; the upper surfaces of the machine stand opposite to the pedestals are respectively provided with a guide rail surface vertical to the direction of the lower roller axes, and the sliding plates are matched on the corresponding guide rail surfaces; a group of oil cylinders which moves horizontally is arranged between the machine stand and the two pedestals; each pedestal respectively supports a lower roller through a lower roller bearing seat, and respectively fixedly provided with a group of lower roller drive device and a lower bearing roller device; one end of each lower roller is correspondingly connected with the lower roller drive device on the same pedestal; each lower roller is supported on the lower b |
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Bibliography: | Application Number: CN2008231415U |