Ultra-wide rolling machine with horizontally adjustable lower roller center distance

The utility model discloses a super-wide plate lapping machine with a horizontally adjustable lower roller center distance, which relates to the technical field of lapping machines. Two pedestals are arranged above a machine stand; the bottom of each pedestal is respectively provided with a sliding...

Full description

Saved in:
Bibliographic Details
Main Authors WU GUILIN, WANG XINGREN, XIA RIDONG, LI BIN, SHI ZHIHUA, LIU ZHAORONG, YU RONGCHUAN
Format Patent
LanguageChinese
English
Published 24.12.2008
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:The utility model discloses a super-wide plate lapping machine with a horizontally adjustable lower roller center distance, which relates to the technical field of lapping machines. Two pedestals are arranged above a machine stand; the bottom of each pedestal is respectively provided with a sliding plate; the upper surfaces of the machine stand opposite to the pedestals are respectively provided with a guide rail surface vertical to the direction of the lower roller axes, and the sliding plates are matched on the corresponding guide rail surfaces; a group of oil cylinders which moves horizontally is arranged between the machine stand and the two pedestals; each pedestal respectively supports a lower roller through a lower roller bearing seat, and respectively fixedly provided with a group of lower roller drive device and a lower bearing roller device; one end of each lower roller is correspondingly connected with the lower roller drive device on the same pedestal; each lower roller is supported on the lower b
Bibliography:Application Number: CN2008231415U