Apparatus and methods for junction formation using optical illumination
Disclosed are methods and systems that include doping a semiconductor with at least one dopant, and exposing the semiconductor to an optical source(s), where the exposing occurs before, during, and/or after an annealing stage of said semiconductor. The annealing stage can include an annealing phase...
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Main Author | |
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Format | Patent |
Language | English |
Published |
11.07.2007
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Subjects | |
Online Access | Get full text |
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Summary: | Disclosed are methods and systems that include doping a semiconductor with at least one dopant, and exposing the semiconductor to an optical source(s), where the exposing occurs before, during, and/or after an annealing stage of said semiconductor. The annealing stage can include an annealing phase and/or an activation phase, which can occur substantially simultaneously. The systems can include at least one doping device for providing at least one dopant to a semiconductor, at least one annealing device to perform an annealing stage, and at least one optical source, where the semiconductor is exposed to light from the optical source(s) before, during, and/or after the annealing stage. |
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Bibliography: | Application Number: CN2005820343 |