Method and apparatus to help promote contact of gas with vaporized material

• Main Author: GREGG JOHN N.,BATTLE SCOTT L.,BANTON JEFFREY I.,NAITO DONN K.,LAXMAN RAVI
• Format: Patent
• Language: English
• Published: 04.07.2007
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; MIXING, e.g. DISSOLVING, EMULSIFYING, DISPERSING; PERFORMING OPERATIONS; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TRANSPORTING

Apparatus and method for enhancement of contact of gas with vaporized material, which in an illustrative arrangement includes a system (100) that delivers a desired gas from a vaporizer (110) to process equipment (120) coupled to vaporizer (110). Vaporizer (110) vaporizes material, receives a gas from a gas source (130) coupled to vaporizer (110), and helps deliver to process equipment (120) gas resulting from contact of the received gas with vaporized material. Vaporizer (110) supports material to be vaporized to help increase exposed surface area of material to be vaporized to help promote contact of the received gas with vaporized material. By promoting contact of the received gas with vaporized material, vaporizer (110) may be used for delivery of the resulting gas to process equipment (120) at relatively higher flow rates.