Removal of metal contaminants from ultra-high purity gases

The invention is a method and apparatus for removing metal compounds from ultra-high purity gases using a purifier material comprising a high surface area inorganic oxide, so that the metals do not deposit on a sensitive device and cause device failure.

Saved in:
Bibliographic Details
Main Author ALVAREZ DANIEL JR.,SCOGGINS TROY B.,NGUYEN TRAM DOAN,OHYASHIKI YASUSHI
Format Patent
LanguageEnglish
Published 27.06.2007
Subjects
CHEMISTRY
COMPOUNDS THEREOF
INORGANIC CHEMISTRY
METALLURGY
NON-METALLIC ELEMENTS
PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
SEPARATION
TRANSPORTING
Online AccessGet full text

Cover

More Information
Summary:The invention is a method and apparatus for removing metal compounds from ultra-high purity gases using a purifier material comprising a high surface area inorganic oxide, so that the metals do not deposit on a sensitive device and cause device failure.
Bibliography:Application Number: CN200580024531