A method for providing alignment of a probe

• Main Author: NIELSEN PETER FOLMER,PETERSEN PETER R. E.,HANSEN JESPER ERDMAN
• Format: Patent
• Language: English
• Published: 30.05.2007
• Subjects: MEASURING; MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES; PHYSICS; TESTING

A method for providing alignment of a probe relative to a supporting substrate, comprises the steps of providing the supporting substrate defining a planar surface and an edge, the substrate further defining a first crystal plane, providing a first mask at the surface of the supporting substrate, the first mask defining a first exposed area on the surface at the edge, and providing a specific etch reagent, a recess formed by the etch reagent etching the first exposed area, the recess defining a first sidewall an opposing second sidewall, an end wall remote from the edge, and a bottom wall. The method further comprises providing a probe substrate defining a planar surface and a second crystal plane identical to the first crystal plane and positioning the probe substrate so that the first and the second crystal planes are positioned identically when forming the probe from the probe substrate using the specific etch reagent, the probe defines congruent surfaces to the first sidewall and the second sidewall.