Production processes and systems, compositions, surfactants, monomer units, metal complexes, phosphate esters, glycols, aqueous film forming foams, and foams stabilizers

Compositions are provided that can include RF(RT)nQ, formula I (I), formula II (II), and/or RCl(RT)nH. The RF group can have four fluorine atoms, the RT group can include a C-2 group having a pendant -CF3 group, n can be at least 1, the R1 group can include a carbon atom, the RCl group can be -CCI3,...

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Main Author BOGGS JANET,BRANDSTADTER STEPHAN M.,CHIEN JOHN,SHARMA VIMAL,EDWARDS E. BRADLEY,HEDRICK VICTORIA,JACKSON ANDREW,LEMAN GREGORY,NORMAN EDWARD,KAUFMAN ROBERT
Format Patent
LanguageEnglish
Published 09.05.2007
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Summary:Compositions are provided that can include RF(RT)nQ, formula I (I), formula II (II), and/or RCl(RT)nH. The RF group can have four fluorine atoms, the RT group can include a C-2 group having a pendant -CF3 group, n can be at least 1, the R1 group can include a carbon atom, the RCl group can be -CCI3, and the Q group can include one or more atoms of the periodic table of elements. Telomerization processes are also provided.
Bibliography:Application Number: CN200580010807