Production processes and systems, compositions, surfactants, monomer units, metal complexes, phosphate esters, glycols, aqueous film forming foams, and foams stabilizers
Compositions are provided that can include RF(RT)nQ, formula I (I), formula II (II), and/or RCl(RT)nH. The RF group can have four fluorine atoms, the RT group can include a C-2 group having a pendant -CF3 group, n can be at least 1, the R1 group can include a carbon atom, the RCl group can be -CCI3,...
Saved in:
Main Author | |
---|---|
Format | Patent |
Language | English |
Published |
09.05.2007
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | Compositions are provided that can include RF(RT)nQ, formula I (I), formula II (II), and/or RCl(RT)nH. The RF group can have four fluorine atoms, the RT group can include a C-2 group having a pendant -CF3 group, n can be at least 1, the R1 group can include a carbon atom, the RCl group can be -CCI3, and the Q group can include one or more atoms of the periodic table of elements. Telomerization processes are also provided. |
---|---|
Bibliography: | Application Number: CN200580010807 |