Method for setting plasma chamber having an adaptive plasma source, plasma etching method using the same and manufacturing method for adaptive plasma source

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Bibliographic Details
Main Author SONG YEONG SU,OH SANG RYONG,KIM SHEUNG KI,KIM NAMHEON,OH YOUNG KUN,LEE DO HYUNG
Format Patent
LanguageEnglish
Published 17.01.2007
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Bibliography:Application Number: CN2004838583