Ion beam etching method and ion beam etching apparatus

An ion beam etching method comprises an etching step of etching an object to be processed with an ion beam extracted by an extraction electrode, and a cooling step of cooling the extraction electrode with an inert gas.

Saved in:
Bibliographic Details
Main Author HORITA AKIHIRO,KUBOTA NAOKI
Format Patent
LanguageEnglish
Published 17.01.2007
Subjects
BASIC ELECTRIC ELEMENTS
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE
Online AccessGet full text

Cover

More Information
Summary:An ion beam etching method comprises an etching step of etching an object to be processed with an ion beam extracted by an extraction electrode, and a cooling step of cooling the extraction electrode with an inert gas.
Bibliography:Application Number: CN200610101820