Substrate processing apparatus

The liquid layer of the developer R on the substrate G rises and flows to the substrate G rear due to gravity in the ramp M2. The liquid layer of the developer R at the speed which almost is equal to conveying speed from the front end of the substrate G facing toward the rear end from state of liqui...

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Bibliographic Details
Main Author HIROSHI KOMIYA,NORIHIKO NISHIMURA,SHUNICHI YAHIRO
Format Patent
LanguageEnglish
Published 10.01.2007
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:The liquid layer of the developer R on the substrate G rises and flows to the substrate G rear due to gravity in the ramp M2. The liquid layer of the developer R at the speed which almost is equal to conveying speed from the front end of the substrate G facing toward the rear end from state of liquid quantity changes in state of the thin liquid layer R'. The substrate G, when it moves to the declivity road M3, the rinse liquid S of the belt shape is supplied to on the substrate from the rinse nozzle 138 from the upper part. Near the line to which the rinse liquid contacts on the substrate G, the developer R' of thin liquid layer state on the substrate G being substituted by the rinse liquid S, development is stopped completely.
Bibliography:Application Number: CN200610094248