Lithographic apparatus and device manufacturing method

An immersion lithographic apparatus is provided with a barrier member which defines a space for containing liquid between the projection system and the substrate. In order to minimize the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immer...

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Bibliographic Details
Main Authors STREEFKERK BOB,DONDERS SJOERD NICOLAAS LAMBER,DE GRAAF ROELOF FREDERICK,HOOGENDAM CHRISTIAAN ALEXANDER,JANSEN HANS,LEENDERS MARTINUS HENDRIKUS AN,LIEBREGTS PAULUS MARTINUS MARI,MERTENS JEROEN JOHANNES, IEPEN MICHEL
Format Patent
LanguageEnglish
Published 08.11.2006
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:An immersion lithographic apparatus is provided with a barrier member which defines a space for containing liquid between the projection system and the substrate. In order to minimize the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In some embodiments the shape of the final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.
Bibliography:Application Number: CN200610077849