Vacuum processor

• Main Author: CHOL HEUN,KIM YOUNGUN,AM HYUN-TACK,LEE SOO-SOUNG,HAN CHAE-PYEONG,CHO SAENG-HYEUN,CHEE DAE-GE
• Format: Patent
• Language: English
• Published: 30.08.2006
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25; NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The context discloses a vacuum treatment device which is used on a substrate for etching treatment or spray plating, for example, the use on the glass piece of a liquid crystal display (LCD) panel, on a semiconductor chip, etc. The vacuum treatment device includes an upper cover and a lower cover which are interconnected. The clearance formed between the upper and the lower covers forms a vacuum treatment space which is sealed or unsealed by a cavity sealing unit through a sealing or unsealing clearance. The device also includes a clearance maintaining unit used for maintaining the clearance and arranged on the upper and the lower covers.