Thin film transistor, inverter, logic device, and method of manufacturing semiconductor device

A complementary metal oxide semiconductor (CMOS) thin film transistor including a common gate, a logic device including the CMOS thin film transistor, and a method of manufacturing the CMOS thin film transistor are provided. In one embodiment, the CMOS thin film transistor includes a base substrate...

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Bibliographic Details
Main Author KIM MOON-KYUNG,LEE JO-WON,PARK YOON-DONG,KIM CHUNG-WOO
Format Patent
LanguageEnglish
Published 09.08.2006
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Summary:A complementary metal oxide semiconductor (CMOS) thin film transistor including a common gate, a logic device including the CMOS thin film transistor, and a method of manufacturing the CMOS thin film transistor are provided. In one embodiment, the CMOS thin film transistor includes a base substrate and a semiconductor layer formed on the base substrate. A PMOS transistor and an NMOS transistor are formed on a single semiconductor layer to intersect each other, and a common gate is formed on the intersection area. In addition, a Schottky barrier inducing material layer is formed on a source and a drain of the PMOS transistor.
Bibliography:Application Number: CN200510131729