Mask, manufacturing method and application thereof

• Main Author: JUNHAO DONG
• Format: Patent
• Language: English
• Published: 26.07.2006
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; ELECTROGRAPHY; FREQUENCY-CHANGING; HOLOGRAPHY; MATERIALS THEREFOR; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL LOGIC ELEMENTS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF

Disclosed are a masking film and a method for making the same. The invention comprises: a transparent base plate, a half penetrating layer and a film layer. Herein, the transparent base board includes a first area, a second area and a third area; the half penetrating layer covers on the second and third area of the transparent base board, and exposes the first area; the film layer covers on the half penetrating layer of the third area for making the transmittance rate of the third area less than that of the second area. The half penetrating layer and film layer can be made with phase excursion thin film for forming phase excursion masking film.