Forming method of mask pattern

• Main Author: KIM CHIN-GUE,HAHN SANGIN,KANG HEEOL,KANG YOO-JIN
• Format: Patent
• Language: English
• Published: 12.07.2006
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; CINEMATOGRAPHY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; MATERIALS THEREFOR; METALLURGY; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

To provide a method for forming a shadow mask pattern, which easily forms a mask having a large area by firstly welding a shadow mask in a state of applying tensile force to a mask frame and forming the vapor deposition pattern by using laser light, in a simple production step and facility and in a short period of production time. This method for forming a shadow mask pattern comprises the steps of: bonding the shadow mask 10 to the mask frame 20; and forming the pattern on the bonded shadow mask 10. The above step of bonding the shadow mask 10 to the mask frame 20 comprises the steps of: making the shadow mask 10 adjoin to the mask frame 20; applying the external force to the shadow mask 10; and bonding the shadow mask 10 to which the external force is applied, to the mask frame 20.