Inductance framework having sputtering film electrode and its production method

This invention relates to an inductance framework with sputtered film electrodes and its production method including a framework and metallic electrode layer characterizing that said framework is made of macromolecule polymer materials, a metallic electrode layer is pasted on the end face of the fra...

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Bibliographic Details
Main Author DEMIAO,REN WANG
Format Patent
LanguageEnglish
Published 28.06.2006
Subjects
BASIC ELECTRIC ELEMENTS
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
ELECTRICITY
INDUCTANCES
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
MAGNETS
METALLURGY
SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
TRANSFORMERS
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Summary:This invention relates to an inductance framework with sputtered film electrodes and its production method including a framework and metallic electrode layer characterizing that said framework is made of macromolecule polymer materials, a metallic electrode layer is pasted on the end face of the framework composed of at least one layer of sputter film, which is a laminated conductor, the framework is prepared by the technology of vacuum environment preparation, cleaning of the framework end face and sputter and coating.
Bibliography:Application Number: CN2006148943