Substrate processing apparatus and substrate processing method

• Main Author: YASUDA SHUICHI,KANAOKA MASASHI,KANEYAMA KOJI,MIYAGI TADASHI,SHIGEMORI KAZUHITO,ASANO TORU,TORIYAMA YUKIO,TAGUCHI TAKASHI,MITSUHASHI TSUYOSHI,OKUMURA TSUYOSHI
• Format: Patent
• Language: English
• Published: 14.06.2006
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES