Dielectric multilayer of microelectronic device and method of fabricating the same
A dielectric multilayer suitable for improving a performance of a microelectronic device and a method of fabricating the dielectric multilayer are provided. The dielectric multilayer of the microelectronic device comprises a composite layer which is formed of oxides of two or more different elements...
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Main Author | |
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Format | Patent |
Language | English |
Published |
31.05.2006
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Subjects | |
Online Access | Get full text |
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