Wet type cleaning process monitoring apparatus and monitoring method

This invention relates to one clearing process monitoring device with one clearing arm and one fluid part. When the arm cleans the transistor, the flow provides one fluid part on transistor. The monitor device at least comprises the following parts: arm position sensor connected to arm when the sens...

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Bibliographic Details
Main Author MURONG,CHEN WU
Format Patent
LanguageEnglish
Published 10.05.2006
Subjects
BASIC ELECTRIC ELEMENTS
CLEANING
CLEANING IN GENERAL
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
MEASURING
MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUIDLEVEL
METERING BY VOLUME
PERFORMING OPERATIONS
PHYSICS
PREVENTION OF FOULING IN GENERAL
SEMICONDUCTOR DEVICES
TESTING
TRANSPORTING
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Summary:This invention relates to one clearing process monitoring device with one clearing arm and one fluid part. When the arm cleans the transistor, the flow provides one fluid part on transistor. The monitor device at least comprises the following parts: arm position sensor connected to arm when the sensor is started; at least one flow sensor unit connected to flow unit to monitor flow providing unit when started. The flow sensor unit at least comprises the following: emission end, receiving end and floating parts, wherein, the receiving end responds to eradiation end to receive signals. The floating element is located between emission end and receiving end. The floating part alters position. The float element makes the receiving end receive the signals from emission end.
Bibliography:Application Number: CN2004190092