Holographic grating etching method used for intermediate infrared distributed feedback quanta cascaded laser

This invention relates to holography grating etching method to prepare infrared quanta laser grating, which comprises the following steps: preparing first grate grating based on holography and controlling two related beam angle to get the accurate grating circle and establishing and optimizing the g...

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Bibliographic Details
Main Author GANGYI,LI XU
Format Patent
LanguageEnglish
Published 22.02.2006
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
DEVICES USING STIMULATED EMISSION
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:This invention relates to holography grating etching method to prepare infrared quanta laser grating, which comprises the following steps: preparing first grate grating based on holography and controlling two related beam angle to get the accurate grating circle and establishing and optimizing the grating system in the infrared quanta system and grating and etching process. The detail process comprises the following steps: a, grating underlay cleaning; b, light etching glue coating; c, front backing of etching glue; d, exploring in intervening system; e, developing; f, solidifying of etching glue; g, erosion of grating underlay; f, removing etching glue.
Bibliography:Application Number: CN2005129022