Composition for forming organic insulating film and method for forming pattern of organic insulating film using the same
A composition for preparing an organic insulating film. The composition includes a functional group-containing monomer, an initiator generating an acid or a radical upon light irradiation or heating, and a linear polymer. Further, an organic insulating film prepared from the composition. Since the o...
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Main Author | |
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Format | Patent |
Language | English |
Published |
15.02.2006
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Subjects | |
Online Access | Get full text |
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Summary: | A composition for preparing an organic insulating film. The composition includes a functional group-containing monomer, an initiator generating an acid or a radical upon light irradiation or heating, and a linear polymer. Further, an organic insulating film prepared from the composition. Since the organic insulating film has a crosslinked structure, it exhibits solvent resistance in subsequent processes. Further, when the organic insulating film is used to fabricate a transistor, it can improve the electrical properties of the transistor. |
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Bibliography: | Application Number: CN200510098086 |