Washing method and washing device
A cleaning effect is improved by cleaning a component that has a recess structure by using a cleaning medium of a liquefied gas or a supercritical fluid. By the cleaning method of removing adhering substances adhering to at least the surface of the recess structure of the component that has the rece...
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Main Authors | , , , , |
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Format | Patent |
Language | English |
Published |
02.11.2005
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Summary: | A cleaning effect is improved by cleaning a component that has a recess structure by using a cleaning medium of a liquefied gas or a supercritical fluid. By the cleaning method of removing adhering substances adhering to at least the surface of the recess structure of the component that has the recess structure, cleaning is carried out by using the supercritical gas or the liquefied gas so that the cleaning medium spreads over the surface of the recess structure. |
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Bibliography: | Application Number: CN200510074277 |